Product category: Design and Development Software
News Release from: Synopsys | Subject: Galaxy Design Platform and DFM
Edited by the Electronicstalk Editorial Team on 14 July 2005
Design tools support OASIS file format
The current production releases of the Galaxy Design Platform and DFM tool suite support the entire Open Artwork System Interchange Standard (OASIS) file transfer format
The Synopsys Galaxy Design Platform and Design For Manufacturing (DFM) tool suite support the entire Open Artwork System Interchange Standard (OASIS) file transfer format with all current production releases. All relevant Synopsys software now support the OASIS format for design and production, including: Astro, IC Compiler, CATS, Hercules, Proteus, SiVL and Star-RCXT software products.
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These products provide the full benefit of OASIS' file compression capability and support the entire specification including the ability to process CBLOCK records which embed compressed data for additional compactness.
Synopsys was an early participant in the semiconductor equipment and Materials International Data Path Task Force Working Group (SEMI DPTF-WG) that defined the new format.
The OASIS specification handles the ever increasing GDSII file sises of complex deep submicron designs.
The specification's compact representation of geometric shapes can reduce file size enabling better tool performance.
It also reduces storage requirements and speeds data file transmission.
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Adoption of OASIS will answer the need for common, open data formats for transferability between mask data prep (MDP) tools.
Mask data file sizes have become so large at the 65nm node that they are unmanageable in a cost-sensitive mask manufacturing environment, captive or merchant.
When fully implemented, OASIS data file sizes decrease by 10-50x and the expression of those files can improve the performance of many of the tools and databases.
Effective management of mask data at 65nm and beyond is not only about file size reduction.
Tool-to-tool data file interoperability and portability are relevant contributing factors affecting the rising costs of design and mask manufacturing.
'The industry is at a key transition point where geometric design and mask layout data can no longer be represented and expressed efficiently enough by GDSII', said Tom Grebinski, President and CEO of OASIS Tooling.
'Synopsys invested significantly in the development of newer features and infrastructure supporting optimal interoperability that scale with the business and technological needs of its customers'.
'High performance, OASIS compliant and interoperable MDP tools, such as those introduced here by Synopsys, become critical and timely for the replacement of GDSII tools'.
'Synopsys always strives to embrace standards that improve our customers' design quality and speed their time to results', said Raul Camposano, Synopsys' Senior Vice President, Chief Technical Officer and General Manager, Silicon Engineering Group.
'With our Galaxy Design Platform and DFM product family support of the entire OASIS specification, we will help designers handle the burgeoning size and complexity of today's advanced designs and ease the transition to a new standard file transfer format'.
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