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Product category: Design and Development Software
News Release from: Aprio Technologies | Subject: Halo suite
Edited by the Electronicstalk Editorial Team on 18 January 2005

Suite promises full
optical proximity correction

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Aprio Technologies is staking its claim as the leading supplier of second-generation DFM tools with the release of its one-of-a-kind Halo suite of tools

In less than two years since its founding, Aprio is bringing to market its first products: Halo OPC, Halo SIM and Halo-Cal. The products deliver a fresh and effective answer to the thorny problems that come with chip design respins, designs that need OPC (optical proximity correction) modification to solve yield issues, or modified designs that require a quick change to mask data (also called ECOs).

Completely complementary, the Halo suite provides the necessary pathway to a truly complete OPC solution.

The Halo suite of tools was created for IC manufacturers using advanced processes particular for the ultra-deep sub-100nm technology nodes and below.

As it stands, manufacturers using first-generation OPC tools are spending weeks to generate the final mask data for their design.

And, in many cases, they are sorely missing an easy methodology to correct any problems found without rerunning the entire OPC generation from the beginning.

Aprio's one-of-a-kind Reconfigurable OPC Technology is the source for Halo OPCs stature as the first tool to reconfigure an OPCed layout for a new, optimised OPC result.

Such a result can deliver huge performance gains, such as 30x faster results in implementing a design change in the mask data.

Clive Wu, PhD, CEO and CTO of Aprio explains: 'Our starting point was creating the Trinity Data Model - a completely new data model capable of understanding circuit, geometry and process information'.

'Armed with the ability to track the relationships between versions of the drawn layout and the corresponding OPC results, we quickly saw several interesting possibilities surface'.

To achieve breathtaking results instead of just incremental improvements, Aprio rethought the problem and came up with several brand new concepts, for which the company has already filed several patents.

Wu continued: 'There are so many good reasons to re-use your previous OPC results so, of course, we do'.

'Halo-OPC makes it possible to get through the mask data preparation phase in a fraction of the time its taking today while maintaining compatibility with the same tools manufacturers are using today'.

Because qualification of an OPC tool can take considerable time and require several test wafers, Aprio has chosen to architect its Halo suite to leverage incumbent OPC tools when applicable.

In those instances, the Halo-Cal tool is used to generate models for Halo-OPC and Halo-Sim that mimic the behaviour of the already-qualified tool.

This calibration tool makes it possible to use Halo-Sim for finding errors in existing OPC results while Halo-OPC is then used to fix those errors in a style consistent with the tool initially used.

As this approach allows for qualification in software, Aprio's Halo suite of tools really complement existing OPC generation tools that have already been qualified by the manufacturer.

Halo-Cal also supports a flexible modelling approach to work straight from measured results when applied to new processes without an existing OPC solution.

'We've already used our tools with customer data in processes below 65nm'.

'Customers have been astonished at our accuracy, especially considering we can even create their initial OPC corrections several times faster than the tools they've used before', said Wu.

'We are excited to present this technology to the market'.

'And there is certainly more to come'.

Time-based licence packages for the Halo suite start from $380,000 and are available immediately.

Halo tools run on Solaris 32 and 64bit, Linux 32 and 64bit, and Linux cluster systems.

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