Product category: Design and Development Software
News Release from: Aprio Technologies
Edited by the Electronicstalk Editorial Team on 2 August 2005
Alliance to address
DFM from manufacturing side
KLA-Tencor and Aprio Technologies are to collaborate on the development of an integrated advanced mask design inspection and repair tool
This collaboration signals KLA-Tencor's latest step forward in providing critical yield management solutions for the growing DFM market. Both companies assert that this partnership will encourage better collaboration between their customers' design and manufacturing teams. As part of this collaboration, Aprio will provide new functionality to products under development at KLA-Tencor that address automated mask layout inspection.
This article was originally published on Electronicstalk on 2 August 2005 at 8.00am (UK)
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By leveraging Aprio's successful Halo suite of manufacturing-side optical proximity correction (OPC) and lithography simulation tools, users will be able to quickly and accurately repair local mask layout errors identified by KLA-Tencor's mask layout inspections.
Unlike first-generation OPC tools, Halo enables users to reconfigure an OPC design layout to correct problems and achieve optimal results without having to re-run the entire OPC generation from scratch - by allowing designers to reuse OPC information that already exists.
As a result, Halo can enable up to 30x faster results in implementing a design change in the mask data.
Further reading
NEC signs for design-for-manufacturing expertise
Design-for-manufacturing specialist Aprio Technologies has signed its first technology partnership with NEC Electronics
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Aprio Technologies has signed up Mike Gianfagna as its new President and Chief Executive Officer
'Our customers that are moving to the 65nm process node can no longer afford to wait to find design issues in the manufacturing process', said Harold Lehon, Vice President of DFM solutions at KLA-Tencor.
'KLA-Tencor and Aprio share similar views on the most optimal way to link the design and manufacturing domains, and we're pleased to be working with an EDA company that is making real inroads into both sides of the tape-out wall'.
Although many DFM companies first create tools for designers, KLA-Tencor and Aprio both see the greater need to address DFM challenges on the manufacturing side first, as that is the source for most DFM problems.
Both also agree on the need to shift from a rules-based handoff procedure to a models-based DFM methodology in order to address the yield impact of shrinking process windows and growing process variability on the design.
A models-based approach allows companies to reduce their sampling and target their process control methods to design areas that matter most, reducing the amount of design rework needed as well as improving yields.
'We are delighted to join forces with KLA-Tencor, the recognised industry leader in reticle inspection technology', said Mike Gianfagna, President and Chief Executive Officer of Aprio Technologies.
'Aprio's innovative approach to incremental and hierarchical mask data processing dovetails perfectly with KLA-Tencor's DFM strategy'.
'Our combined efforts will provide a new-to-the-industry capability for our customers'.
Initial availability of an integrated product from KLA-Tencor and Aprio is expected in 2006.
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