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Product category: IC and Hybrid Processing Equipment
News Release from: Vistec Electron Beam | Subject: SB3050
Edited by the Electronicstalk Editorial Team on 10 April 2006
E-beam system prepares for 32nm
technology
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A high-performance variable shaped electron beam system enables direct patterning for the 32nm technology node for R and D and prototyping.
At last week's Semicon Europe 2006, Vistec Electron Beam released the new SB3050, a high-performance variable shaped beam (VSB) system that enables direct patterning for the 32nm technology node for R and D and prototyping This technology node will be introduced into production only in 2013