Laurence Marchini, Editor, writes:
We see from your search that you're looking for information on the term "Patterning", and we have a large number of manufacturers' news releases and technical articles here on Electronicstalk which will be of interest. Let me be your guide.
Start with the news release Research agreement targets sub-32nm memory from IMEC, which we summarised at the time by saying "PSC will collaborate with IMEC's advanced lithography program addressing immersion, double patterning and EUV lithography challenges". A few weeks before, we featured the news release Mixed-signal process runs on 32nm node from TSMC: "Leading edge technology is optimised for low power, high density and manufacturing margins with optimal process complexity and cost management".
In August 2007, we covered the news from Powerlase concerning its Starlase AO8 - take a look at Top power lasers to ramp up plasma production which says: "The introduction of the Powerlase laser systems has significantly altered flat-panel production methods".
Take a look also at the news release from Cadence Design Systems, Pattern-synthesis technology acquired, as well as Tutorial to explain laser patterning processes from UK Displays and Lighting Network, and Shrinking life cycles good for e-beam lithography from Vistec Electron Beam.
See also:
ILT promises many benefits over old technology (March 2007)
Inverse Lithography Technology techniques surpass previous technical stalwarts such as optical proximity correction
UK-Korea forum leads to laser business (January 2007)
In 2002 Powerlase's Sales Manager Duncan Cooper presented at the Global Watch Service-led UK-Korea H