Product category: Design and Development Software
News Release from: Synopsys | Subject: Liberty library format
Edited by the Electronicstalk Editorial Team on 8 August 2006
Library expands for sub-65nm coverage
New extensions are available for the Liberty library format, the de-facto open-source modelling standard for integrated circuit implementation and signoff
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Synopsys has announced new extensions to the Liberty library format, the de-facto open-source modelling standard for integrated circuit (IC) implementation and signoff. The new extensions facilitate variation-aware design, allowing engineers to control design margins, improve design robustness, and increase parametric yield.
To help ensure the highest level of accuracy, these new Liberty extensions are built on composite current source (CCS) models, the industry's first current-based models to unify timing, signal-integrity and power.
Process variation models are the enablers to variation-aware design and emerging applications such as statistical static timing analysis.
These applications account for uncertainties due to variability in device and interconnect at sub65nm technology nodes.
Further reading
Collaboration on e-beam pattern inspection tools
Companies are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building for e-beam manufacturing at 45nm and beyond
Place and route software supports 45nm process
Place and route software has faster runtime, higher capacity, smarter multi-corner/multi-mode optimisations, improved predictability and physical design support for the 45nm technology wave
In order to be of high value to designers, it is crucial for the variation-based cell models to be built on the most accurate representation of silicon behaviour.
CCS modelling technology has been proven to deliver excellent accuracy to within 2% of HSpice tools at leading semiconductor companies and forms a solid foundation for these new Liberty modelling extensions.
'With these new extensions, Synopsys continues its long history of delivering open-source library modelling innovations to support the latest silicon technologies', said Ahsan Bootehsaz, Vice President, Engineering, Synopsys Implementation Group.
'This offering is a key component of our strategy to address the emerging design-for-manufacturing challenges at sub-65nm by enabling variation-aware design and furthering openness and interoperability in our industry'.
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