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Product category: Design and Development Software
News Release from: Synopsys
Edited by the Electronicstalk Editorial Team on 19 April 2007
Collaboration on e-beam pattern
inspection tools
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Companies are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building for e-beam manufacturing at 45nm and beyond.
Synopsys and NanoGeometry Research, a provider of electron-beam pattern-inspection tools for microelectronics manufacturing, are collaborating to enable faster, more accurate, more predictive optical proximity correction (OPC) model building at 45nm and beyond This collaboration brings together advanced design for manufacturing (DFM) and metrology expertise to focus on building advanced "manufacturing aware" OPC and reticle enhancement technology (RET) lithography simulation models