Product category: Design and Development Software
News Release from: Mentor Graphics UK
Edited by the Electronicstalk Editorial Team on 28 February 2002
Busy time for Mentor at SPIE conference
Mentor Graphics will preview its new Calibre mask data preparation (MDP) technology and contribute 11 technical papers at the 27th annual SPIE Microlithography conference.
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Mentor Graphics will preview its new Calibre mask data preparation (MDP) technology and contribute 11 technical papers at the 27th annual SPIE Microlithography conference, to be held from the 3rd to 8th March 2002 at the Santa Clara Convention Centre and Westin Hotel, in Santa Clara, California. Visitors to booth 736 will learn about Mentor's new MDP software that completes the layout-to-silicon flow, which will be formally introduced on 11th March. This extension of the Calibre physical verification and manufacturability tool suite enables semiconductor companies that have standardised on Calibre to export mask-ready data from Calibre directly to mask-writer formats such as MEBES.
This optimises mask writer efficiency despite ever-growing design sises.
A special presentation entitled, "Mask data preparation: new challenges, new solutions and the end of fracturing", will be presented in SPIE's Product Forum Demo in the exhibition hall, on Wednesday 6th March at 1230.
Frank Schellenberg and Steffen Schulse of Mentor Graphics will demonstrate that mask data preparation in the subwavelength era demands fast, flexible hierarchical geometry processing treatments of IC layout data, not just format translation.
Mentor Graphics will also be heavily involved in many of the technical sessions at SPIE.
The company has had 11 technical papers accepted by the conference on resolution enhancement technologies (RET), with topics ranging from "Contrast-based assist feature optimisation", to "Design verification flow for model-assisted double dipole decomposition".
Registrants should consult registration packets or visit www.spie.org for times and locations of individual paper presentations.
Mentor Graphics will also host the second annual Calibre technology summit at SPIE.
Current Calibre software users will attend to present technical papers and share tips and techniques to help prioritise future enhancements on using Calibre software for optical and process correction (OPC), phase-shift mask (PSM), scattering bars (SB), and other yield-enabling RET and MDP techniques.
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