University orders lithography system

A Heidelberg Instruments product story

Edited by the Electronicstalk editorial team May 15, 2006

Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics at the University of Erlangen-Nuremberg.

Heidelberg Instruments has sold an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics (Max Planck Research Group) at the University of Erlangen-Nuremberg.

The DWL400 system will enable the user to expose minimum structures on photoresist down to 0.6um, with an active write area of up to 400 x 400mm.

"The laser lithography will be mainly used for direct writing of microstructured optical elements and materials".

"We especially appreciate the openness of HIMT towards new ideas that involve changing hardware or software and are looking forward to this co-operation", states Dr Sabine Koenig, Project Co-ordinator at the Institute of Optics, Information and Photonics.

"In most research environments, performance and flexibility are crucial to success of various projects", says Alexander Forozan, Vice President of Sales and Marketing.

"At the University of Erlangen-Nuremberg Institute of Optics, this is realised by customisation, in addition to existing capabilities crucial for micro optics research such as grey scale exposure (128 levels), ability to expose thick resist and layer to layer alignment".