Naval Research Lab takes to maskless lithography

Heidelberg Instruments, , Heidelberg, Germany, announced the installation of a DWL66 maskless lithography system at the Naval Research Laboratory, Institute of Nanosciences, Washington DC, USA.

Heidelberg Instruments has installed a DWL66 maskless lithography system at the Naval Research Laboratory, Institute of Nanosciences, Washington DC, USA.

The DWL66 is a unique, maskless lithography system for mask making and direct writing.

This system is capable of producing patterns down to 0.6um, and is equipped with the capability of thick resist and grey scale exposure, in addition to metrology, front to backside and layer to layer alignment.

"As part of our ongoing enhancement to the equipment capabilities we have recently purchased and installed a Heidelberg DWL-66 laser pattern generator (HLPG)".

"The DWL-66 allows researchers to design and fabricate wafer masks in-house, eliminating the long turnaround time normally required when working with outside sources".

"Furthermore, the DWL-66 is capable of writing directly to a wafer".

"This capability is crucial for direct writing of microstructures dedicated to interfacing nanodevices fabricated by e-beam lithography".

"Our experience working with the DWL-66 and with Heidelberg Instruments has been superb", said Darrel King, Naval Research Laboratory.

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