Click on the advert above to visit the company web site
Product category: IC and Hybrid Processing Equipment
News Release from: Vistec Electron Beam
Edited by the Electronicstalk Editorial Team on 15 March 2007
Shrinking life cycles good for e-beam
lithography
Request your FREE weekly copy of the Electronicstalk email newsletter. News about IC and Hybrid Processing Equipment and more every issue. Click here for details.
Luncheon Symposium reports on conditions affecting the application of 'electron beam direct write' as a manufacturing technology for semiconductors.
The first E-Beam Direct Write Luncheon Symposium held by Vistec Electron Beam underlined 'Electron beam direct write' as a cost-effective technology and an increasingly important solution in semiconductor production During this year's SPIE Conference, Vistec Electron Beam invited recognised industry experts to discuss the latest developments in e-beam direct write (EBDW)