Product category: Electronics Manufacturing Machinery and Materials
News Release from: Vistec Semiconductor Systems | Subject: LWM9045
Edited by the Electronicstalk Editorial Team on 13 March 2007
Mask measurement handles critical dimensions
SEM-based critical dimension measurement system for photomasks addresses the needs for 45nm technology node photomask production and 32nm process development
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Next generation mask metrology tool is designed to support the 45nm technology node and beyond
Available now from Vistec Semiconductor Systems, the LWM9045 is an SEM-based critical dimension (CD) measurement system for photomasks. The tool was designed specifically to address the needs for 45nm technology node photomask production and 32nm process development. 'Vistec LWM9045 is the tool for unsurpassed dynamic CD measurement repeatability in the subnanometre regime and will certainly continue the success story of the LWM series', stated General Manager Gerhard Ruppik.
'Within two years after presenting the first system, we gained a market share of 75%'.
The LWM9045 is like its precursor LWM9000 the result of a co-operative effort with Advantest, Japan.
Compared with the last tool generation, the measurement performance was increased by 30%, with an outstanding long term repeatability of better than 1nm.
Further reading
Infra-red inspection for Japanese sensors
A Japanese sensor manufacturer has ordered two fully automated IRIS2000 infra-red inspection and review systems, worth more than Eur 1 million
European MEMS maker sees more with IR inspection
Vistec Semiconductor Systems has delivered two INM100 IR infra-red inspection systems to a European MEMS manufacturer
'Our customers appreciate the excellent long-term repeatability thanks to the extremely low electron charging and practically nonexistent substrate contamination', explained Product Manager Gerhard Schlueter.
The incorporation of a new beam blanking system into the LWM9045's redesigned column helps to control charging during the measurement process.
The enhanced functionality of its ozoniser enables lowest contamination rates.
The scanning system, re-engineered for reduced noise, together with a new detector system is leading to excellent measurement precision.
The use of a highly accurate laser stage combined with software positioning corrections results in stage accuracy uncertainty of less than +/-75nm.
Therefore, in most cases local pattern matching can be avoided achieving greater throughput and system productivity.
The new graphical user interface has been designed for ease of system operation and measurement job programming.
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