Product category: Electronics Manufacturing Machinery and Materials
News Release from: Vistec Semiconductor Systems | Subject: LMS IPRO4
Edited by the Electronicstalk Editorial Team on 13 March 2007
Mask measurements support
45nm and below
Next generation mask metrology tool is designed to support the 45nm technology node and beyond
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New from Vistec Semiconductor Systems, the LMS IPRO4 is a next generation mask metrology tool designed to support the 45nm technology node and beyond. Vistec's LMS IPRO4 is a fully automated mask metrology system, capable to measure registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and in reflected light.
'The measurement performance has been significantly enhanced'.
'Therefore, the LMS IPRO4 will support the ever more demanding metrology needs of the leading edge semiconductor mask manufacturers and their customers', explains Product Manager Jochen Bender.
The excellent performance of the new system gains access to the market fast: several purchase orders for LMS IPRO4 systems have already been placed by the most advanced captive mask shops in Europe and the USA.
Further reading
Infra-red inspection for Japanese sensors
A Japanese sensor manufacturer has ordered two fully automated IRIS2000 infra-red inspection and review systems, worth more than Eur 1 million
European MEMS maker sees more with IR inspection
Vistec Semiconductor Systems has delivered two INM100 IR infra-red inspection systems to a European MEMS manufacturer
'The LMS IPRO series is a bestseller due to its measurement performance and reliability'.
'We are convinced that our new LMS IPRO4 will continue the success story of the series which was installed more than 60 times', states General Manager Gerhard Ruppik.
Compared with the previous tool generation, the LMS IPRO4 provides an enhanced measurement performance with a typical long term repeatability of better than 1.6nm.
Contributing to the outstanding measurement performance are the re-engineered optical path as well as the redesigned stage drive system, which enables higher positioning accuracy.
The design of the LMS IPRO4 combines maximum throughput with minimum programming time and operator interference.
All measurement jobs can easily be prepared and learned on- or offline.
Another well-proven characteristic is the DEVA data evaluation software package, which remains an integral part of Vistec Semiconductor Systems' LMS IPRO metrology solution.
It automates the statistical analysis of the gathered data and allows the user to define data evaluation macros.
Due to its networking capability, operators and engineers can remotely operate the system and evaluate the results.
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