Product category: Electronics Manufacturing Machinery and Materials
News Release from: Powerlase | Subject: Starlase 2kW
Edited by the Electronicstalk Editorial Team on 29 May 2007
High power laser is EUV source
New device firmly places the laser produced plasma EUV source approach as the main contender to be the source of choice for the high volume manufacturing of semiconductor chips
Powerlase has added a new high power laser to its Starlase range. The 2kW class laser module combined with Powerlase's patented approach of spatial and temporal multiplexing will have a significantly positive impact on satisfying the requirements of the EUV source from a laser power point of view.
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Two lasers to produce EUV light source
Powerlase and the University of Central Florida have teamed up to develop a Laser Produced Plasma (LPP) EUV light source which uses a combination of two lasers for the first time
Record turnover for laser specialist
The manufacturer of the world's most powerful nanosecond Q-switched, diode-pumped solid state (DPSS) lasers, has announced record turnover for the financial year ending 31st December 2006
The new device firmly places the laser produced plasma (LPP) EUV source approach as the main contender to be the source of choice for the high volume manufacturing of semiconductor chips.
The combination of a high power laser per single module with the efficiency of the diode pumped solid state laser will make the LPP approach power scaleable to satisfy the demand of the industry at a low running cost.
The new Starlase laser will drive Powerlase's world leading research to achieve workable solutions for the high volume manufacture of semiconductor chips by 2009.
Further reading
College and Powerlase research laser light sources
Powerlase, a manufacturer of diode-pumped solid state (DPSS) lasers has announced a research collaboration with University College Dublin (UCD) in Ireland
Powerlase recently announced a significant breakthrough in the scalability of the EUVL sources by achieving the ability to multiplex modular lasers used in EUV source generation to increase power scalability.
The new laser will be used in further research offering high output power at a wavelength of 1064nm, short pulse and excellent beam properties well suited for the EUV generation.
It can be multiplexed to produce the power required to revolutionise semiconductor manufacture.
Samir Ellwi, VP Strategic Innovations of Powerlase comments: 'The development of the 2kW class laser demonstrates our relentless drive to further developments in laser technology to meet real world needs'.
'Our existing technology is already proving world class for both PDP manufacture and our multiplexed EUV laser will transform semiconductor manufacturing'.
Tony King, CEO commented 'I'm delighted that we are continuing to break new ground in partnership with our customers and partners in forging the next generation technology for existing manufacturing challenges and in developing novel methods for emerging manufacturing techniques'.
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