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Product category: Electronics Manufacturing Machinery and Materials
News Release from: Powerlase
Edited by the Electronicstalk Editorial Team on 12 February 2007

College and Powerlase
research laser light sources

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Powerlase, a manufacturer of diode-pumped solid state (DPSS) lasers has announced a research collaboration with University College Dublin (UCD) in Ireland

The research will further the development of Laser Produced Plasma (LPP) as an Extreme Ultraviolet (EUV) Lithography light source. The aim of the research is to provide the industry with a proven, robust and cost-effective laser product capable of providing a suitable light source for use in EUV Lithography.

Researchers from UCD will use vacuum equipment provided by Powerlase to conduct a study of ion emissions of the LPP EUV source.

The LPP EUV approach is considered to be a very promising technology for the high volume manufacture of semiconductors at 32nm and below.

Powerlase has already reported research collaborations in EUV Lithography with the Extreme Ultraviolet Lithography Association (EUVA) in Japan and leading US academics at the University of Central Florida (UCF).

Powerlase has supplied both organisations with Starlase lasers in order to further advance the EUV source development required for EUVL.

Dr Samir Ellwi, Powerlase Vice President of Strategic Innovations comments: 'POWERLASE is very excited to be working with the leading academics at UCD to support the development of Extreme Ultraviolet sources for next-generation lithography techniques'.

'We believe the LPP source approach, which is driven by a diode-pumped solid-state laser, is the way forward in achieving the requirements for the EUV source'.

'The technique also drives down cost of ownership in comparison to other laser technologies'.

'We are committed to providing the industry with a workable laser solution and supporting EUV development'.

'The equipment that POWERLASE is providing to UCD will aid the University's advancement and research in this area'.

Professor Gerry O'Sullivan, Head of School of Physics at University College Dublin, comments: 'Our work with Powerlase will be extremely valuable in progressing the EUV research and development programme and strengthening our links with the major industrial players in this exciting and important field'.

'We are dedicated to advancing next-generation lithography techniques and believe our work with Powerlase will lead to significant breakthroughs in EUV lithography'.

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