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Product category: IC and Hybrid Processing Equipment
News Release from: Oxford Instruments Plasma Technology
Edited by the Electronicstalk Editorial Team on 13 September 2007
Collaboration targets nano-imprint
lithography
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Nano-imprint lithography is a versatile, cost-effective, flexible and high-throughput method for fabrication of down to and below 10nm structures.
Oxford Instruments and NIL Technology have collaborated to develop etch processes targeted at nano-imprint lithography Nano-imprint lithography is a versatile, cost-effective, flexible and high-throughput method for fabrication of down to and below 10nm structures