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Product category: Design and Development Software
News Release from: Mentor Graphics UK | Subject: Calibre
Edited by the Electronicstalk Editorial Team on 29 January 2003

Chinese startup foundry selects Calibre

Note: A free brochure or catalogue is available from Mentor Graphics UK on the products in this news release. Click here to request a copy.

Grace Semiconductor Manufacturing Company has selected Calibre from Mentor Graphics as an internal standard for physical verification and manufacturability

Grace semiconductor manufacturing Company (GSMC) has selected Calibre from Mentor Graphics as an internal standard for physical verification and manufacturability. GSMC is a new "pure-play" foundry based in Shanghai, China, and was formed to help address the IC manufacturing needs of the global electronics market.

Calibre DRC (design rule checking) and Calibre LVS (layout versus schematic) rule decks are available now for GSMC's advanced technology processes.

"Calibre's extensive rule file coverage, design-style independence and on-time customer support made it the best choice for the complex designs our customers are creating", said Stephen Kuo, Design Service Department Manager of the Technology Development Unit at GSMC.

"Selecting Calibre ensures customers a confident design transfer and a smooth manufacturing process".

"Calibre has been pivotal in establishing a solid infrastructure in semiconductor foundries throughout the world", said Joseph Sawicki, General Manager, Mentor Graphics Design-to-Silicon Division.

"GSMC's adoption of Calibre as the internal standard is a signal that China's new foundries are committed to high standards of manufacturing".

Calibre is the industry's only complete physical verification and subwavelength solution.

The Calibre physical verification tool suite, which includes Calibre DRC and Calibre LVS, ensures that IC physical designs conform to manufacturing rules and match the intended functionality of the chip.

As the market leader in physical verification tools, Calibre is the industry standard, used in 19 of the world's 25 largest integrated device manufacturers, as well as all the top foundries and deep submicron library providers.

For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite to add, model and verify layouts for all four RET techniques: optical and process correction (OPC), phase-shift mask (PSM), scattering bars (SB) and off-axis illumination (OAI), plus the new techniques such as sub-100nm capable double-exposure dipole decomposition technique currently being refined for production deployment.

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