Product category: Design and Development Software
News Release from: Mentor Graphics UK | Subject: Calibre
Edited by the Electronicstalk Editorial Team on 22 October 2004
DFM technology runs on design-to-silicon
platform
Calibre Transition, Measure and Analyse are new features designed address critical design for manufacturing (DFM) requirements.
Calibre Transition, Measure and Analyse are new features designed address critical design for manufacturing (DFM) requirements Mentor has also outlined its long-term roadmap for future Calibre DFM tools, which will allow users to consider and optimise for manufacturing at various stages in the design flow: design, verification and analysis, tapeout and test
This article was originally published on Electronicstalk on 6 Jun 2001 at 8.00am (UK)
Related stories
Cell, block and full-chip verification in one
New from Mentor Graphics, Calibre Interactive enables designers to perform block and cell physical verification from within layout environments such as Cadence Virtuoso.
Verification extends to mask making
Mentor Graphics has extended its Calibre technology to include the capability to export IC layout data directly into mask-writer formats.
The Calibre design-to-silicon platform is a comprehensive set of tools addressing the complex handoff between design and manufacturing.
The cornerstone of the Calibre design-to-silicon platform is a single, robust hierarchical data processing engine that allows for the essential interaction and data sharing required between all tools in the platform.
"Design for manufacturing is nothing new, but the degree to which nanometre technologies have created additional yield considerations is unprecedented", said Joe Sawicki, Vice President and General Manager, Design-to

