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Product category: Electronics Manufacturing Services
News Release from: EDA Solutions | Subject: Mosis 8WL MPW
Edited by the Electronicstalk Editorial Team on 12 March 2007

Shared wafers to run on IBM SiGe BiCMOS

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Mosis now offers prototype and low volume fabrication access to IBM's fourth generation foundry technology, 8WL, the 130nm silicon germanium BiCMOS process.

Mosis now offers prototype and low volume fabrication access to IBM's fourth generation foundry technology, 8WL, the 130nm silicon germanium BiCMOS process The process uses an emitter width of just 120nm and can be used to produce devices with an Ft of 100GHz