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Product category: Design and Development Software
News Release from: Synopsys | Subject: Proteus
Edited by the Electronicstalk Editorial Team on 18 June 2007

Measurement link aids optical proximity
correction

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Design for manufacturing interface helps customers to develop faster, more accurate and predictive OPC models for advanced 45nm and beyond technologies.

Synopsys and Hitachi High-Technologies Corp have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution Focused on incorporating manufacturing-aware metrology data into design, this common design for manufacturing (DFM) interface helps mutual customers to develop faster, more accurate and predictive OPC models for advanced 45nm and beyond technologies