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Product category: Design and Development Software
News Release from: Synopsys | Subject: Proteus
Edited by the Electronicstalk Editorial Team on 18 June 2007
Measurement link aids optical proximity
correction
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Design for manufacturing interface helps customers to develop faster, more accurate and predictive OPC models for advanced 45nm and beyond technologies.
Synopsys and Hitachi High-Technologies Corp have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution Focused on incorporating manufacturing-aware metrology data into design, this common design for manufacturing (DFM) interface helps mutual customers to develop faster, more accurate and predictive OPC models for advanced 45nm and beyond technologies
This article was originally published on Electronicstalk on 26 Feb 2004 at 8.00am (UK)