Product category: Design and Development Software
News Release from: Synopsys
Edited by the Electronicstalk Editorial Team on 23 December 2005
NEC adopts phase-shift mask technology
NEC Electronics has adopted Synopsys' phase-shift mask (PSM) technology for production of its high-performance 65nm processor and logic chips
By implementing this key technology, which is part of Synopsys' comprehensive design for manufacturing (DFM) solution, NEC Electronics can enhance yields, decrease leakage current, and maximise chip performance through tight critical dimension control over the lithography process. Synopsys PSM technology is being increasingly deployed by high-performance system-on-chip (SoC) manufacturers worldwide.
This article was originally published on Electronicstalk on 23 December 2005 at 8.00am (UK)
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It gives designers the benefit of tighter control of critical dimension (CD), the width of feature sizes on the silicon, and enhanced lithography resolution which is critical at the 65nm node and beyond.
The benefit of this tighter CD is increased chip performance and higher yield, which means more dies on the wafer meet design specifications.
Synopsys' PSM technology will be used to support the ramp of NEC Electronics' 65nm CMOS process.
'To increase the performance of our products, we must move to deeper submicron processes and adopt technology that addresses unique manufacturing requirements', said Shuichi Inoue, General Manager of the Manufacturing Operations Unit at NEC Electronics.
'Synopsys' PSM technology substantially enhances the resolution of our existing lithography equipment enabling us to increase our yields, decrease leakage current, and improve our chip performance at the 65nm node'.
'We work closely with our customers to develop processes which accelerate high-yield chip production on advanced process nodes', said Anantha Sethuraman, Vice President of Marketing for DFM, Synopsys.
'Synopsys' PSM technology is a proven solution for delivering the lithography resolution required for the 65nm process node'.
'This success further validates Synopsys' leadership position in providing a comprehensive DFM solution for high-yield designs at 65nm and beyond'.
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