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Product category: Design and Development Software
News Release from: Synopsys
Edited by the Electronicstalk Editorial Team on 17 September 2004
Programme aims for photomask
improvements
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Synopsys and Photronics have set up a joint programme to improve the manufacturability and quality of advanced photomasks and reducing the cycle times for design-to-photomask flows.
Synopsys and Photronics have set up a joint programme to improve the manufacturability and quality of advanced photomasks and reducing the cycle times for design-to-photomask flows Synopsys and Photronics will jointly explore and develop solutions in the area of design for manufacturing (DFM) and mask synthesis targeting faster time to yield for semiconductor manufacturers