News Release from: Synopsys
Edited by the Electronicstalk Editorial Team on 29 July 2004
SMIC adopts optical proximity correction
Proteus optical proximity correction (OPC) software has been adopted at Semiconductor Manufacturing International Corp (SMIC) as part of the company's 130nm process.
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Proteus optical proximity correction (OPC) software has been adopted at semiconductor manufacturing International Corp (SMIC) as part of the company's 130nm process. Proteus will enable SMIC to obtain OPC results within hours and reduce mask synthesis turnaround time. "SMIC is committed to providing our customers with the best service, including high yields and quick turn-around-time", said Dr Simon Yang, vice president of Logic Technology Development Centre of SMIC.
"Proteus OPC software helps us better serve our customers".
"Proteus has become critical for achieving the demanding turn-around-time and accuracy that is needed at the leading semiconductor vendors throughout the world", said Sandeep Khanna, Vice President of Marketing for DFM at Synopsys.
"The broad adoption of Proteus throughout the world by leading semiconductor vendors such as SMIC validates the need for our highly scalable, high-accuracy mask synthesis solution for small process geometries".
Proteus plays an increasingly critical role in enabling optical lithography to keep pace with shrinking chip dimensions such as those at 130nm.
OPC correction at smaller geometries requires significantly more processing time.
Proteus' unique architecture provides near-linear scalability that allows customers to reduce turn-around-time by using inexpensive Linux-based central processing unit (CPU) clusters.
Several leading-edge semiconductor companies have deployed Proteus to reduce mask synthesis turnaround time from days to hours.
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