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Product category: Design and Development Software
News Release from: Synopsys
Edited by the Electronicstalk Editorial Team on 3 February 2004

Toshiba takes PSM route to 65nm

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Toshiba Semiconductor Company has licensed the rights, on a per-use basis, to use Synopsys' alternating phase-shift mask technology for production of high-performance processors and logic chips

Toshiba Semiconductor Company has licensed the rights, on a per-use basis, to use Synopsys' alternating phase-shift mask (PSM) technology for production of high-performance processors and logic chips. Toshiba expects to enter volume production on its the 65nm process built with this technology in the first half of 2005.

"Our research and development qualification shows that Synopsys PSM technology enables us to increase our yields and control our chip performance at 65nm by substantially improving the resolution of our existing lithography equipment", stated Masakazu Kakumu, Technology Executive for Toshiba Semiconductor Company.

"Having strong control over our lithography process is a critical component in meeting our yield goals for production on this difficult node".

Synopsys' PSM technology will be used to support the ramp of Toshiba's CMOS5 65nm process node.

In December 2002, Toshiba developed the CMOS5 65nm production process technology, which offered 30nm transistors and 180nm pitches using 193nm argon fluoride (ArF) lithography and PSM technology.

Toshiba's anticipated launch date of April 2004 places them among the very first companies to announce leading-edge 65nm capability.

"Synopsys is committed to delivering technology and software products that accelerate its customers' high-yield chip production on advanced process nodes", said Sanjiv Kaul, General Manager of the New Ventures business unit at Synopsys.

"Based on multiple sets of silicon results, Synopsys' PSM technology has been proven to deliver the lithography resolution required for the 65nm process node.

Our ability to support Toshiba's industry-leading ramp of its CMOS5 process node demonstrates our PSM technology's continued value in a production environment".

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