Product category: Design and Development Software
News Release from: IMEC
Edited by the Electronicstalk Editorial Team on 22 January 2008
EUVL experiments explore manufacturing
options
The collaboration between CNSE and IMEC will also involve scientists from IBM and ASML, which has built the world's first full-field EUVL R and D tool, the Alpha Demo Tool.
The College of Nanoscale Science and Engineering (CNSE) of the University at Albany in Albany, New York, USA and IMEC in Leuven, Belgium are jointly performing extreme ultraviolet lithography (EUVL) experiments in order to accelerate the introduction of EUVL into manufacturing The first set of collaborative experiments will be carried out at CNSE's Albany NanoTech Complex, with future joint studies to be conducted at CNSE and IMEC, depending on throughput and/or the tools
This article was originally published on Electronicstalk on 20 Feb 2002 at 8.00am (UK)
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