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Product category: Stand-Alone Instruments
News Release from: Hitachi High-Technologies (Electron Microscopy) | Subject: FB-2100
Edited by the Electronicstalk Editorial Team on 15 October 2002
Ion beam system samples semiconductors
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A new focused ion beam milling system is ideal for specimen preparation of semiconductors and other advanced materials for both scanning electron microscopy and transmission electron microscopy.
A new focused ion beam milling system, suitable for specimen preparation of semiconductors and other advanced materials for both scanning electron microscopy (SEM) and transmission electron microscopy (TEM) has been developed by Hitachi High-Technologies Corp The FB-2100 joins the FB-2000A in providing complex surface etching capabilities combined with high-resolution scanning ion imaging