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Product category: Electronics Manufacturing Materials and Consumables
News Release from: ASML | Subject: Twinscan system
Edited by the Electronicstalk Editorial Team on 11 December 2006
Imaging, overlay and throughput improvements
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ASML Holding has introduced its newest Twinscan system, an advanced 193-nanometer (nm) exposure system which features imaging, overlay and throughput improvements
Exposure system features imaging, overlay and throughput improvements ASML Holding has introduced its newest Twinscan system, an advanced 193-nanometer (nm) exposure system which features imaging, overlay and throughput improvements. The Twinscan XT:1450 is targeted for high volume manufacturing, an extension of dry ArF to sub-60-nm.
This article was originally published on Electronicstalk on 11 December 2006 at 8.00am (UK)